MUNICH, Germany – September 18, 2019 – Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) will feature its F7000 electron-beam (EB) lithography system and related metrology equipment in Hall A, stand #7 at the 45th Micro & Nanoengineering (MNE) Conference, taking place September 23-26 at the Rodos Palace Hotel in Rhodes, Greece.
Returning to Greece after 11 years, the MNE Conference is the primary international event focused on micro/nanofabrication and manufacturing techniques as well as applications of fabricated micro/nanostructures, devices and microsystems in electronics, photonics, energy, environment, chemistry and life sciences. The conference features four parallel sessions, plenary talks, invited presentations, oral and poster presentations, and a commercial exhibition.
Within its stand, Advantest will showcase its F7000 EB lithography system, which delivers high-throughput and superior resolution along with the ability to create very accurate and smooth nanopatterns on wafers for the 1X-nm technology node. Its character-projection, direct-write technology makes it well-suited as a design tool for R&D and prototyping as well as a solution for LSI production lines, where small-lot-multiple-type devices are produced.
Advantest's portfolio of nanotechnology solutions includes several other metrology products, including a family of multi-vision metrology scanning electron microscope (MVM-SEM®) systems that enable real-time, 3D measuring and imaging of wafers and photomasks. Introduced this year, the E3650 Mask MVM-SEM system delivers the industry's best pattern-measurement capability and highest throughput for applications including advanced photomasks, EUV photomasks and NIL templates. The company's E5610 mask defect review scanning electron microscope (DR-SEM) is designed for reviewing and classifying ultra-small defects in next-generation photomasks and blanks. It offers highly stable, fully automatic image capturing with the long-term operational stability and reliability essential for manufacturing analyses of critical masks.
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Note: All information supplied in this release is correct at the time of publication, but may be subject to change.