MASK-DR SEM E5600 series


The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.

∗DR-SEM = Defect Review - Scanning Electron Microscope

  • High Spatial Resolution
  • Highly Stable, Fully Automatic Image Capture
  • Compatible with Mask Inspection Systems
  • Elemental Composition Analysis Option
  • Backscattered Electron Analysis Option
Supported materials 6025 size photomasks
SEM spatial resolution 2nm
EDS energy resolution (Option) 127eV
For further details, please contact our sales team.

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