MASK DR-SEM E5620
MASK-DR SEM E5600 series
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
∗DR-SEM = Defect Review - Scanning Electron Microscope
- High Spatial Resolution
- Highly Stable, Fully Automatic Image Capture
- Compatible with Mask Inspection Systems
- Elemental Composition Analysis Option
- Backscattered Electron Analysis Option
|Supported materials||6025 size photomasks|
|SEM spatial resolution||2nm|
|EDS energy resolution (Option)||127eV|
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