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2015-07-14 00:30:00.0 Topics

Munich, Germany — July 14, 2015 — Leading semiconductor equipment supplier Advantest Corporation (TSE: 6857, NYSE: ATE) has had the honor of being named AMTC's Best Supplier for 2014. This award recognizes the excellent performance that Advantest's Mask MVM-SEM (3D-CDSEM) tools deliver and the close relationship the two companies maintain in their on-going partnership. The award is based on performance in three critical areas: purchasing; technical capabilities; and process support. Of the 11 suppliers included in the survey, Advantest took the top ranking across the board. A key element of Advantest's success is the company's close collaboration with AMTC, which ensures that needs are continually aligned and addressed for future products.

"With Advantest, we honor a supplier who has worked above and beyond our expectations, demonstrating their commitment to our success" said Mr. Thomas Schmidt, general manager of AMTC.

Advantest's Mask MVM-SEM tools are utilized to measure patterns on leading-edge ArF and EUV masks for both logic and memory devices. In addition to long-term operational stability, the tools offer very high reliability — essential for high-volume production environments. AMTC also noted that Advantest's field service staff is highly skilled, with a passion for satisfying customer requirements. Their support enables swift ramps of customer manufacturing processes.

"This award further demonstrates that Advantest not only offers high quality products, but has a dedicated global team that works tirelessly to ensure that we deliver the best to our customers," said Josef Schraetzenstaller, managing director and CEO of Advantest Europe GmbH.

About AMTC

The Advanced Mask Technology Center GmbH & Co. KG (AMTC) is an equally owned joint venture of GLOBALFOUNDRIES and Toppan Photomasks, Inc. AMTC is a world-leading center for the development and production of advanced photolithographic masks. More information is available at www.amtc-dresden.com.

Note: All information supplied in this release is correct at the time of publication, but may be subject to change without warning.