E-Beam Lithography

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Experience our EB solutions, designed to revolutionize next-generation semiconductor production processes.

As the miniaturization of IC devices continues, electron beam exposure technology is gaining prominence as a useful technology for next-generation design rules. Advantest is offering EB lithography system that uses E-Beam direct-write technology not only as a design tool for research and development, but also as a tool suitable for system LSIs production lines where mostly small-lot-multiple-type products are produced. To help reduce your development costs and shorten development periods, please give serious consideration to Advantest's E-Beam Solution.

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