New Critical Dimension-Scanning Electron Microscope System Improves Yield & Accuracy
TOKYO, Japan, November 11, 2010 - Advantest Corporation (TSE: 6857, NYSE: ATE) today announced availability of its new SEM-based Critical Dimension (CD) measurement system for next-generation photomasks and patterned media. The E3630 is completely compatible with Advantest's existing E3610/E3620 CD-SEM measurement system, but boasts 30% improved linewidth repeatability.
As semiconductor device features continue to shrink, photomask patterning challenges have created new requirements for highly precise, stable metrology. Advantest's E3600 series of CD-SEM measurement systems is already in use by multiple leading semiconductor and photomask manufacturers.
The E3630 features a newly developed objective lens and ultra-low-vibration platform, enabling 30% higher linewidth repeatability compared to the E3610/E3620. This industry-best performance makes the E3630 ideally suited for measuring the critical dimension (CD) of the miniature-sized patterns on photomasks for EUV (extreme ultraviolet) and nanoimprint lithography. The tool is optimal for photomask development and manufacturing evaluation at the 22nm and 16nm production nodes.
The E3630 is compatible with Advantest's existing CD-SEM systems, enabling users to utilize existing software.
Note: All information supplied in this release is correct at the time of publication, but may be subject to change without warning.